Comprehensive Evaluation of Low Temperature and Weak Light Tolerance of 50 Processing Pepper Doubled Haploid at Seedling Stage
〔Chongqing Academy of Agricultural Science，Chongqing Key Laboratory of Adversity Agriculture，Key Laboratory for Evaluation and Utilization of Characteristic Crop Germplasm Resources in Southwest Mountainous Areas（Jointly Established by Departments and Provinces），Chongqing 401329，China〕
Abstract：Abstract：50 pepper DH lines developed through anther culture were used as experimental materials atseedling stage．Comprehensive evaluation of low temperature and weak light resistance was carried out byseven indexes（SPAD value，Fv/Fm，root diameter，dry mass of stem and leaf，dry mass of root，dry mass ofwhole plant and root-shoot ratio）with fuzzy membership function and cluster analysis．The results showed thatthe comprehensive index range of the fuzzy membership function for low temperature and weak light tolerance of 50 DH lines is between 0.20 and 0.76，and the 50 DH lines were divided into two categories by clusteranalysis．According to the characteristics of low temperature and weak light tolerance，and the comprehensiveindex of fuzzy membership function，it could be determined that 7 materials in class Ⅱ were low temperatureand weak light resistant materials（H201605-8，H201604-4-1，H201612-4-1，H201605-7，H201612-4，H201605-34 and H201604-18）．These results suggested that there is a significant difference in low temperatureand weak light tolerance among 50 processing pepper DH lines，which can be used as experimental materialsfor related mechanisms study．The selected 7 low temperature and weak light tolerance DH lines provide amaterial basis for cultivating excellent pepper varieties suitable for facility cultivation，and also provide areference for future targeted cultivation of new biological stress resistant germplasm materials．
